High-Vacuum Multi-Arc Ion Coating System
Category： Materials Research (Research Equipment)
Overview
Technical Specifications
This product is a high-vacuum multi-arc ion coating system specifically developed to meet the demands of high-purity, high-performance hard-film deposition. With “high-vacuum cleanliness, high-efficiency multi-arc ion deposition, dense and durable film layers, and convenient, user-friendly operation” as its core positioning, it strikes an optimal balance between laboratory R&D and small-batch production applications. It is perfectly suited for coating scenarios in universities, research institutes, and industrial enterprises, providing stable and reliable hardware support for surface modification of substrates such as metals, ceramics, and alloys.
Key features:
1. High-Vacuum Clean Coating: The high-vacuum chamber design effectively isolates the system from external impurities, minimizes gas interference, ensures film purity, and prevents oxidation-related defects, thereby meeting the demands of high-end coating processes.
2. High-efficiency multi-arc ion deposition: Utilizing a multi-arc target configuration, this process achieves a high ionization rate and rapid deposition, enabling the fabrication of hard coatings such as metallic, nitride, and carbide films that are dense, exhibit strong adhesion, and offer excellent wear and corrosion resistance.
3. Convenient and Easy-to-Use Operation: Touchscreen interface with pre-set coating process parameters, supporting the storage and recall of multiple parameter sets to streamline operation, lower the learning curve, enable quick onboarding for beginners, and minimize human error.
4. Wide-ranging application scenarios: Suitable for various substrates such as metals, ceramics, and glass, enabling the deposition of functional thin films with properties like wear resistance, corrosion resistance, and decorative aesthetics, which are extensively used in cutting tools, molds, optical components, electronic components, and other fields.
5. Stable, Durable, and Easy to Maintain: The chamber structure is robust and long-lasting, target materials can be replaced conveniently, maintenance is straightforward, and the system is well-suited for long-term, high-frequency operation, ensuring stable equipment performance.
| Project | Details | |
| 1. Vacuum Chamber | Φ500 × H420 mm, made of 304 stainless steel, with a front-opening door design; chamber heating temperature: room temperature to 350 ± 1°C; | |
| 2. Vacuum System | High-vacuum system comprising a composite molecular pump, a directly coupled rotary vane pump, and high-vacuum valves, equipped with a digital composite vacuum gauge. | |
| 3. Vacuum Limit | Better than 6.0×10⁻⁵ Pa (no load, after bake-out); | |
| 4. Leakage Rate | Equipment pressure rise rate ≤ 0.8 Pa/h; | |
| Equipment pressure hold: After the pump is stopped for 12 hours, the vacuum shall be ≤10 Pa. | ||
| 5. Pumping Speed | (No load) Pumping from atmospheric pressure to 5.0×10⁻³ Pa within ≤15 minutes; | |
| 6. Substrate Stage Dimensions | Φ150 mm, with 3 self-rotating workstations; | |
| 7. Substrate Stage Rotation | Substrate rotation: 0–20 rpm; | |
| 8. Sputtering Target | Two sets of DN100 new-type magnetic-filter multi-arc targets | |
| 9. Pulse Bias Power Supply | -1000V, 1 set; | |
| 11. Control Method | PLC + touch-screen HMI semi-automatic control system; | |
| 12. Alarm and Protection | Generate alarms and activate corresponding protective measures for abnormal conditions such as water shortage, overcurrent, overvoltage, and open circuits in pumps, electrodes, and other equipment; implement a comprehensive logic-based interlock protection system. | |
| 13. Land Occupation | (Main unit) L1900×W800×H1900 (mm). | |
You May Also Like
Price Inquiry
You can contact us through any convenient means, and we provide services 24/7 via phone or email. We are happy to answer your questions