Single-target DC magnetron sputtering coating system
Category： Magnetron sputtering system
Overview
Technical Specifications
This product is a cost-effective, single-target magnetron sputtering coating system independently developed by our company. Featuring a compact, precision-engineered design, it strikes an ideal balance between a small footprint and outstanding performance. With a sleek, sophisticated appearance and comprehensive functionality, it is specifically tailored for laboratory thin-film deposition applications, making it the preferred choice for research and experimentation. Its primary application is the efficient preparation of single- or multi-layer films in a wide range of materials, including ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard-coating, and polytetrafluoroethylene (PTFE) films. It is well-suited for material research, laboratory R&D, and other diverse settings, meeting varied experimental requirements and helping to accelerate scientific progress.
Key features:
1. Convenient and hassle-free operation: the entire instrument is controlled via a high-definition touch screen and features a built-in one-touch intelligent coating program, eliminating the need for complex procedures. Even beginners can quickly get up to speed, significantly lowering the barrier to entry for experimental operations.
2. Equipped with high-performance, practical components, including one high-power strong-magnetic target and one 1500 W DC power supply, it is precisely tailored for the preparation of metallic thin films. Standard configuration includes one high-precision mass flow meter, with customization options up to four gas lines, enabling easy establishment of complex gas environments.
3. Highly efficient, time- and labor-saving: standard configuration includes an advanced turbo-molecular pump unit (with a ultimate vacuum of 1.0 × 10⁻⁵ Pa and multiple models available for selection); solenoid valves enable precise control of the gas flow path, allowing sample retrieval without shutting down the pump; an integrated industrial PC is available as an optional upgrade for centralized, multifunctional control of the entire system, significantly enhancing experimental efficiency and convenience.
| Sample stage | External dimensions | Φ360mm |
| Adjustable speed | Adjustable from 1 to 20 rpm | |
| Magnetic Control Target Gun | Target material plane | Circular planar target |
| Sputtering vacuum | 0.1 Pa to 3 Pa | |
| Target diameter | 100–101.6 mm | |
| Target thickness | 3mm | |
| Insulation voltage | >2000V | |
| Cable Specifications | SL-16 | |
| Target head temperature | ≦65℃ | |
| Vacuum chamber | Inner wall treatment | Electropolishing |
| Cavity dimensions | Φ500mm × 500mm | |
| Cavity material | 304 stainless steel | |
| Observation Window | Quartz window, diameter φ100mm | |
| Activation method | Side opening | |
| Gas Control | Traffic Control | Mass flow meter, range 0–100 SCCM |
| Types of gases | Optional gases include argon, nitrogen, oxygen, and more. | |
| Control Valve Type | Electromagnetic control valve | |
| Static state of the control valve | Normally Closed | |
| Measure linearity | ±1.5% F.S | |
| Measurement repeatability | ±0.2% F.S | |
| Measure response time | ≤8 seconds (T95) | |
| Operating pressure differential range | 0.3MPa | |
| Valve body pressure rating | 3MPa | |
| Operating ambient temperature | (5–45)°C | |
| Valve body material | Stainless steel 316L | |
| Valve body leak rate | 1×10⁻⁸ Pa·m³/s | |
| Pipe fitting | 1/4″ ferrule fitting | |
| Input/Output Signals | 0–5 V | |
| Power supply | ±15 V (±5%) (+15 V, 50 mA; −15 V, 200 mA) | |
| External dimensions mm | 130 (width) × 102 (height) × 28 (thickness) | |
| Communication Interface | RS485 MODBUS Protocol | |
| DC power supply | Power supply wattage | 1500W |
| Film thickness measurement | Power Requirements | DC: 5V (±10%) * High current 400mA |
| Resolution | ±0.03 Hz (5–6 MHz), 0.0136 Å / measurement (aluminum) | |
| Measurement accuracy | ±0.5% thickness + 1 count | |
| Measurement cycle | 100 ms to 1 s per measurement (adjustable) | |
| Measurement range | 500,000 Å (aluminum) | |
| Crystal frequency | 6MHz | |
| Communication Interface | RS-232/485 serial interface | |
| Display Digits | 8-digit LED display | |
| Molecular pump | Molecular pump pumping speed | 1200L/S |
| Rated speed | 24000rpm | |
| Vibration value | ≦0.1 µm | |
| Startup Time | 5min | |
| Downtime | 7min | |
| Cooling method | Water cooling + air cooling | |
| Cooling water temperature | ≦37℃ | |
| Coolant flow rate | 1L/min | |
| Installation Direction | Vertical ±5° | |
| Vacuum port | 150CF | |
| Exhaust port | KF40 | |
| Front-stage pump | Pumping speed | VRD-16 |
| Ultimate vacuum | 1Pa | |
| Power supply | AC: 220V/50Hz | |
| Motor power | 400W | |
| Noise | ≦56 dB | |
| Vacuum port | KF40 | |
| Exhaust port | KF25 | |
| Valve | Gate valve | A gate valve is installed between the vacuum chamber and the molecular pump. |
| Shut-off valve | A shut-off valve is installed between the molecular pump and the backing pump. | |
| Bypass valve | A bypass valve is installed between the vacuum chamber and the forepump. | |
| Bleed valve | An electromagnetic vent valve is installed on the vacuum chamber. | |
| Ultimate vacuum of the entire machine | ≦5×10⁻⁴ Pa | |
| Test target material | One nickel target with a diameter of 4 inches and a thickness of 3 mm | |
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