Three-Target Magnetron Sputtering Coating System

This product is a cost-effective, laboratory-specific magnetron sputtering coating system independently developed by our company. Built on a standardized architecture and modular design with customizable adaptation options, it strikes an optimal balance between performance and ease of use, making it the preferred equipment for thin-film fabrication in laboratories. It is widely compatible with experimental requirements across multiple disciplines and can efficiently deposit single- or multi-layer films of ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard-material, and polytetrafluoroethylene coatings, thereby facilitating the efficient advancement of research projects.

Product Features:

1. The target power supply is highly flexible and configurable: users can choose a 1/2-inch magnetron sputtering target, with a standard dual-power configuration of 500 W DC (for metal films) and RF (for non-metal films). The three-target design effortlessly meets the demands of multi-layer and multi-pass coating, and custom power supplies ranging from 300 W to 1000 W are also available to suit a wide variety of experimental applications.

2. The gas-path vacuum system is outstanding, featuring two high-precision mass flow meters as standard (with customization available up to four channels), paired with an advanced turbomolecular pump unit that achieves an ultimate vacuum of 1.0 × 10⁻⁵ Pa. It supports sampling without shutting down the pump, significantly reducing experimental time and enhancing work efficiency.

3. Convenient and hassle-free operation, compact footprint for easy placement, optional all-in-one industrial PC, one-button control of the entire system—including the vacuum pump unit and sputtering power supply—streamlining workflows, lowering the barrier to experimentation, and accommodating a wide range of laboratory applications.