Dual-Target DC Magnetron Sputtering Coating System

This product is a high-cost-performance, dual-target DC magnetron sputtering coating system independently developed by our company, specifically designed for laboratory thin-film fabrication while balancing practicality and ease of use. Its primary applications include the deposition of single-layer or multi-layer ferroelectric films, conductive films, alloy films, and other types of thin films, making it an ideal piece of equipment for materials research and thin-film preparation in the lab.

Key features:

1. Flexible Compatibility: The magnetron sputtering target is available in 1-inch and 2-inch sizes to accommodate substrates of different dimensions; it comes standard with two 500 W DC power supplies, supporting multi-layer and multi-pass coating processes to meet a wide range of deposition requirements.

2. Customizable and Highly Efficient: The standard configuration includes two high-precision mass flow meters, with the option to customize up to four; it is also equipped with a turbo molecular pump unit (ultimate vacuum of 1.0E-5 Pa), enabling sample collection without shutting down the pump and thereby significantly enhancing operational efficiency.

3. Convenient Operation: Compact in size and easy to operate, the system can be optionally equipped with an all-in-one industrial PC to enable centralized control of multiple functions, including the vacuum pump unit and sputtering power supply, thereby enhancing experimental efficiency.