Single-target DC magnetron sputtering coating system

This product is a cost-effective, single-target DC magnetron sputtering coating system independently developed by our company, specifically designed for laboratory thin-film fabrication. It combines high practicality with excellent cost-effectiveness and is suitable for a wide range of laboratory settings. Its primary application is the efficient deposition of single-layer ferroelectric films, conductive films, alloy films, and more, making it widely used in materials research laboratories—particularly in areas such as solid-state electrolytes and OLEDs. It is the preferred equipment for thin-film preparation in laboratory environments.

Key features:

1. Flexible Compatibility: The magnetron sputtering target is available in 1-, 2-, and 3-inch sizes and can be paired with a 1,500 W high-power DC power supply. Additional DC or RF power supplies of other specifications can also be optionally configured to easily meet the coating requirements for various materials and processes.

2. Precision and Efficiency: Standard configuration includes two high-precision mass flow meters, with customization available for up to four channels, enabling easy setup of complex gas environments; ultimate vacuum reaches 1.0 × 10⁻⁵ Pa, supporting sampling without shutting down the pump, thereby significantly enhancing experimental efficiency.

3. Convenience and Intelligence: Featuring a standardized, modular design, this system is compact and easy to operate. It can be optionally equipped with an all-in-one industrial PC to enable fully integrated control of vacuum pump units, sputtering power supplies, and other key components, thereby further enhancing experimental convenience and efficiency.