Three-Target Magnetron Sputtering Coating System with a Transition Chamber

This product is a three-target magnetron sputtering coating system with a transition chamber, a precision instrument specifically designed for the preparation of metallic thin films. It meets both research and practical application needs, with a structural design tailored to laboratory settings and related industrial applications, ensuring stable and reliable performance. Its primary function is the efficient deposition of metallic thin films, making it widely used in industries such as electronics, optics, and the production of advanced ceramics. Additionally, it is compatible with SEM sample preparation in laboratories, satisfying diverse application requirements for scientific research, experimental studies, and new-materials development.

Key features:

1. Multi-target synergy for multi-layer coating: Equipped with three magnetron sputtering targets and two DC power supplies, this system enables flexible deposition of multi-layer conductive metal films, accommodating diverse film-layer requirements and enhancing operational flexibility.

2. Dual-chamber design for high efficiency and energy savings: The system features a separate main chamber and a transfer chamber, with the transfer chamber equipped with a magnetic push rod and a vacuum gate valve between the two chambers. This configuration allows for sputtering to proceed concurrently with sample loading and pre-vacuum pumping, thereby reducing the number of vacuum pumping cycles in the main chamber and significantly saving time.

3. Controllable vacuum for enhanced coating quality: The dual-chamber independent vacuum design effectively maintains the local vacuum level in the main chamber, minimizes impurity interference, and significantly improves film density and uniformity, thereby delivering high-quality coating results.