Three-Target DC Magnetron Sputtering Coating System

This product is a cost-effective magnetron sputtering coating system independently developed by our company. Designed with a focus on laboratory thin-film deposition applications, it features a standardized, modular architecture, making it the preferred equipment for such settings. Its primary application is the efficient fabrication of single- or multi-layer films in a wide range of materials, including ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard-material, and polytetrafluoroethylene coatings, thereby meeting the diverse experimental requirements across multiple disciplines.

Key features:

1. Customizable and highly adaptable to diverse requirements: The magnetron sputtering target is available in a 1/2-inch configuration, ensuring precise matching with substrates of various sizes; it comes standard with a 500 W DC power supply (suitable for metal thin films) and can be customized with RF or pulsed power supplies ranging from 500 W to 1000 W. The gas delivery system is equipped as standard with two high-precision mass flow meters, which can be upgraded to a maximum of four, enabling easy establishment of complex gas environments.

2. High efficiency and hassle-free operation to enhance experimental performance: Standard configuration includes an advanced turbomolecular pump unit with a ultimate vacuum of 1.0 × 10⁻⁵ Pa (other models available as options); solenoid-valve-controlled gas lines allow sample loading and unloading without shutting down the pump, significantly saving time; optional integrated industrial PC enables full-process automated control for efficient and convenient operation.

3. Cost-effective premium choice: compact in size and easy to operate, balancing standardized quality with flexible customization; widely applicable and, compared with similar equipment, delivering superior value for money to meet diverse thin-film preparation needs in laboratories.