Desktop Single-Target Magnetron Sputtering Coating System

Category: Magnetron sputtering system

This product is suitable for the preparation of metal thin films and finds applications in the electronics, optics, and advanced ceramics industries; it can also be used for preparing SEM samples in the laboratory. Its key features include compactness, practicality, and an intuitive user interface that makes it easy to learn and operate.

Overview

Technical Specifications

This product is a high-performance, compact device specifically developed to meet the desktop-level requirements for metal thin-film deposition in laboratories. With “stable film formation, compact portability, and user-friendly operation” as its core design principles, it strikes an optimal balance between research-grade precision and desktop practicality. It is ideally suited for a wide range of teaching and research applications in university, research institute, and corporate laboratories, providing stable and reliable hardware support for the preparation of various fundamental metal thin films.

Key features:

  1. Stable and reliable film formation: Equipped with a desktop-grade single-target DC sputtering system, featuring a stable DC power supply and a high-precision micro vacuum control system, the sputtering process is smooth and free of fluctuations, resulting in uniform, dense films with strong adhesion and precise control over film thickness and performance consistency.
  2. Desktop-Grade Compact Design: Featuring a miniaturized, integrated architecture that is small in size and space-efficient, eliminating the need for a dedicated large laboratory. It can be placed directly on a desktop for use, making it ideal for teaching demonstrations, rapid coating of small samples, and other applications.
  3. Convenient and easy-to-control operation: touch-screen interface combined with preset basic coating processes simplifies the workflow, lowers the learning curve, enables quick onboarding for beginners, minimizes human error, and ensures efficient and convenient teaching demonstrations and experimental tuning.
  4. Laboratory adaptation and optimization: The entire unit features a robust and durable structure, easy maintenance, and low operating noise, making it suitable for placement on various laboratory countertops and for use in teaching and research settings.
  5. Wide range of applications: It can be used to fabricate various metal conductive films, electrode films, protective coatings, and more, with extensive applications in semiconductor teaching experiments, optical coating demonstrations, fundamental sensor R&D, material surface modification, and other fields.
Project Details
Sample stage External dimensions φ100mm
Heating temperature ≦500℃
Adjustable speed ≦20 rpm
Magnetic Control Target Gun Equip with a 2-inch magnetron sputtering target; target dimensions: diameter 50.8 mm, thickness ≤ 3 mm.
Vacuum chamber Cavity dimensions φ194mm × 263mm
Observation Window φ50mm
Cavity material 304 stainless steel
Activation Method Top-opening type
Vacuum system Front-stage pump Low-Noise Dual-Rotor Vane Pump
Molecular pump Low-noise, high pumping speed turbomolecular pump
Vacuum measurement Combined vacuum gauge, range: 10⁻⁵ to 10⁵ Pa
Vacuum port KF16
Vacuum port KF40
Exhaust port KF16
System vacuum 1.0×10⁻⁴ Pa
Power supply AC 220V 50/60Hz
Pumping speed Molecular pump pumping speed: 60 L/s; backing pump pumping speed: 1.1 L/s.
Power Configuration Number of power supplies One set of DC power supply
Output power 500W DC power supply
Other parameters Supply voltage AC 220V, 50Hz
Total machine power 2kW
Weight 80kg
Overall dimensions 550mm x 450mm x 750mm

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