Desktop Single-Target Magnetron Sputtering Coating System
Category: Magnetron sputtering system
Overview
Technical Specifications
This product is a high-performance, compact device specifically developed to meet the desktop-level requirements for metal thin-film deposition in laboratories. With “stable film formation, compact portability, and user-friendly operation” as its core design principles, it strikes an optimal balance between research-grade precision and desktop practicality. It is ideally suited for a wide range of teaching and research applications in university, research institute, and corporate laboratories, providing stable and reliable hardware support for the preparation of various fundamental metal thin films.
Key features:
- Stable and reliable film formation: Equipped with a desktop-grade single-target DC sputtering system, featuring a stable DC power supply and a high-precision micro vacuum control system, the sputtering process is smooth and free of fluctuations, resulting in uniform, dense films with strong adhesion and precise control over film thickness and performance consistency.
- Desktop-Grade Compact Design: Featuring a miniaturized, integrated architecture that is small in size and space-efficient, eliminating the need for a dedicated large laboratory. It can be placed directly on a desktop for use, making it ideal for teaching demonstrations, rapid coating of small samples, and other applications.
- Convenient and easy-to-control operation: touch-screen interface combined with preset basic coating processes simplifies the workflow, lowers the learning curve, enables quick onboarding for beginners, minimizes human error, and ensures efficient and convenient teaching demonstrations and experimental tuning.
- Laboratory adaptation and optimization: The entire unit features a robust and durable structure, easy maintenance, and low operating noise, making it suitable for placement on various laboratory countertops and for use in teaching and research settings.
- Wide range of applications: It can be used to fabricate various metal conductive films, electrode films, protective coatings, and more, with extensive applications in semiconductor teaching experiments, optical coating demonstrations, fundamental sensor R&D, material surface modification, and other fields.
| Project | Details | |
| Sample stage | External dimensions | φ100mm |
| Heating temperature | ≦500℃ | |
| Adjustable speed | ≦20 rpm | |
| Magnetic Control Target Gun | Equip with a 2-inch magnetron sputtering target; target dimensions: diameter 50.8 mm, thickness ≤ 3 mm. | |
| Vacuum chamber | Cavity dimensions | φ194mm × 263mm |
| Observation Window | φ50mm | |
| Cavity material | 304 stainless steel | |
| Activation Method | Top-opening type | |
| Vacuum system | Front-stage pump | Low-Noise Dual-Rotor Vane Pump |
| Molecular pump | Low-noise, high pumping speed turbomolecular pump | |
| Vacuum measurement | Combined vacuum gauge, range: 10⁻⁵ to 10⁵ Pa | |
| Vacuum port | KF16 | |
| Vacuum port | KF40 | |
| Exhaust port | KF16 | |
| System vacuum | 1.0×10⁻⁴ Pa | |
| Power supply | AC 220V 50/60Hz | |
| Pumping speed | Molecular pump pumping speed: 60 L/s; backing pump pumping speed: 1.1 L/s. | |
| Power Configuration | Number of power supplies | One set of DC power supply |
| Output power | 500W DC power supply | |
| Other parameters | Supply voltage | AC 220V, 50Hz |
| Total machine power | 2kW | |
| Weight | 80kg | |
| Overall dimensions | 550mm x 450mm x 750mm | |
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