High-Vacuum Electron-Beam Evaporation Coating System

Category: Thin Film Preparation

This product is primarily used for the preparation of various conductive films, semiconductor films, ferroelectric films, and optical films, as well as for micro- and nano-fabrication of microdevices and for the pre-treatment of electron microscopy samples. It is particularly well suited for the vapor deposition of a wide range of refractory metal materials. In addition to hard substrates such as glass wafers and silicon wafers, it can also be used for coating on flexible substrates like PDMS, PTFE, and PI.

Overview

Technical Specifications

This product is a high-end piece of equipment specifically developed for the preparation of high-precision, high-purity thin films. It integrates electron-beam evaporation technology with a high-vacuum system, catering to both laboratory R&D and small-batch production needs. Widely used in industries such as semiconductors, optics, and new energy, it provides stable and reliable hardware support for the deposition of thin films made from a variety of materials, including metals, oxides, and ceramics. 
Key features: 
1. High-vacuum assurance: Equipped with a high-efficiency vacuum pumping system that delivers ultra-high vacuum and excellent sealing, effectively isolating the process from impurity interference to ensure film purity and prevent oxidative contamination. 
2. Precise electron-beam control: The electron gun provides precise focusing and highly concentrated energy, enabling stable evaporation of high-melting-point materials. This results in uniform, dense film layers with strong adhesion and reduced defects. 
3. Intelligent and Convenient Operation: The touch-based user interface supports presetting, storing, and recalling process parameters, ensuring simple operation, minimizing human error, and accommodating both research and production environments. 
4. High adaptability: Compatible with a wide range of coating materials, it can fabricate single-layer and multilayer composite films to meet diverse research and production requirements, while featuring a compact design and easy maintenance.

ProjectDetails
Sample stageExternal dimensions<150 mm, sample stage is rotatable
Adjustable temperature≦500℃
Electron gunNew-type electron gun, 6-hole crucible
Heating lampFour halogen heating lamps are used for degassing, and one neon lamp is used for illumination.
Vacuum chamberCavity dimensionsΦ500*H500mm
Observation WindowDiameter φ100mm
Cavity Material304 stainless steel
Activation MethodFront-opening type
Film thickness measurementMonitoring is performed using an SQM160 film-thickness gauge, with coating thickness non-uniformity less than 6%.
Vacuum systemFront-stage pumpTwo-stage rotary vane pump, gas pumping speed 1.1 L/s
Secondary pumpTurbomolecular pump, gas pumping speed 600 L/s
Vacuum measurementCombined vacuum gauge (ionization gauge + resistance gauge)
System vacuum5×10⁻⁵ Pa
Water-cooling systemWater pressure < 2.5 bar, water pressure monitoring
Heating lampFour halogen heating lamps are used for degassing, and one neon lamp is used for illumination.
Electrode interfaceEquipped with two metal steam electrode interfaces
Control SystemCYKY’s self-developed professional-grade controller
Other parametersPower supplyAC 380V, 50Hz
Overall dimensions1000mm × 800mm × 1500mm
Total machine power20KW
Overall weight350kg

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