Desktop Dual-Source Evaporation Coating System

This product is a high-performance deposition system specifically designed for advanced laboratory R&D and precision dual-source evaporation coating of small-scale samples. Its core features include independent dual-source evaporation, precise coating control, a compact desktop-friendly design, and PLC-based intelligent touch-screen operation. As a lightweight evaporation-coating solution, it balances deposition expertise, operational convenience, and operational stability. Leveraging the advantages of independent dual-source control and precise evaporation technology, it meets the requirements for fabricating composite and multilayer films on a wide range of small samples. It is widely used in laboratory R&D of small samples, small-batch pilot production, preparation of small-scale composite thin films for semiconductor devices, graphene-assisted coating, material surface modification, and multilayer coating of miniature research specimens—addressing demanding experimental needs. This system serves as the core equipment for desktop-level, high-precision dual-source evaporation coating experiments in laboratories, providing an efficient, precise, and clean integrated solution for scientific research and the preparation of high-precision composite coatings on small samples.
Key features:
1. Dual-source independent evaporation to meet complex coating requirements: The system is equipped with two independently powered evaporation sources, enabling flexible operation in either alternating or simultaneous modes to accommodate a wide range of deposition processes. It supports independent evaporation, simultaneous evaporation, or stepwise evaporation of two different materials, with precise control over the temperature and deposition rate of each source. This allows for the easy fabrication of multilayer and composite films, addressing the limitation of single-source evaporation in achieving multi-material composite coatings and meeting the advanced research needs of laboratories for the preparation of composite and multilayer films.
2. Precision Evaporation Coating with Outstanding Film Quality: Utilizing advanced, high-precision evaporation coating technology, a single evaporation source can stably deliver a coating current of up to 100 A, with an evaporation temperature as high as 1800°C. The system features stable temperature control and current output, along with broad process compatibility. The evaporation temperature, rate, and coating time for each of the two evaporation sources can be independently and flexibly adjusted, enabling precise control over film thickness and uniformity. The resulting films exhibit strong adhesion, high density, and tight interlayer bonding, effectively minimizing defects such as pinholes, delamination, and layer separation. This ensures stable thin-film performance and meets the stringent precision requirements of advanced laboratory research.
3. Compact desktop design for space-saving and easy placement: Specifically optimized for laboratory benchtop environments, this instrument features a streamlined, compact form factor and lightweight construction, allowing it to be placed directly on standard lab workstations without requiring dedicated installation space. It is compatible with a wide range of lab bench layouts, making it particularly well-suited for space-constrained university labs and small research institutions—offering flexible, space-efficient operation while seamlessly integrating dual-source functionality with desktop convenience.
4. Intelligent PLC Touch Control for Efficient and Convenient Operation: Equipped with an upgraded PLC intelligent control system, this equipment features full HD touchscreen operation throughout the entire process. The interface is simple and intuitive, with clearly defined functional sections, and supports functions such as separate memory storage of dual-source coating parameters, program presets, fault alarms, and one-touch adjustment of power for both evaporation sources. It allows users to pre-set a variety of commonly used dual-source evaporation coating programs, ensuring a streamlined operating workflow that can be quickly mastered without extensive training. This makes it ideal for laboratory researchers and professional operators.
5. Multi-scenario adaptability and broad application scope: The system fully meets the requirements of evaporation deposition for various common metallic materials while also accommodating the deposition needs of certain non-metallic materials. It is suitable for coating small samples made of metals, oxides, semiconductors, and other materials, and finds extensive applications in high-end experimental settings such as laboratory R&D on small-scale samples, small-batch pilot production, fabrication of small-scale composite thin films for semiconductor devices, graphene-assisted deposition, material surface modification, and multilayer coating of microscale specimens. In addition, the system supports inert-gas-assisted protective atmosphere, further enhancing its application value.
6. Stable and Durable with Convenient, Hassle-Free Maintenance: The overall structure has been optimally designed, with high-quality components selected for the core dual-evaporation units, coated chamber, and temperature-control system, ensuring stable, trouble-free operation, strong anti-interference capability, and long-term continuous performance—making it ideally suited for high-frequency, benchtop-level dual-source evaporation coating experiments in laboratories. Daily maintenance is simple and convenient; no specialized personnel are required for operation and upkeep. Regular routine inspections and cleaning of the chamber and dual-evaporation units are sufficient to ensure normal equipment operation, significantly reducing laboratory equipment maintenance costs.