Laboratory Multi-Arc Ion Plating System
Category: Thin Film Preparation
Overview
Technical Specifications
This product is a high-performance device specifically developed to meet the needs of laboratory surface modification and hard-film deposition. With “high-efficiency multi-arc deposition, dense film quality, ultra-high vacuum cleanliness, and user-friendly operation and compatibility” as its core design principles, it combines compact sizing with practical research applications. It is ideally suited for a wide range of coating scenarios in university, research institute, and corporate laboratories, providing stable and reliable hardware support for surface coating on substrates such as metals, ceramics, and alloys.
Key features:
1. High-efficiency multi-arc ion deposition: Utilizing a multi-arc target configuration, this process achieves a high ionization rate and rapid deposition, enabling the fabrication of hard coatings such as metallic, nitride, and carbide films that are dense, exhibit strong adhesion, and offer excellent wear and corrosion resistance.
2. High-Vacuum Clean Coating: The high-vacuum chamber design effectively isolates the system from external impurities, minimizes gas interference, ensures film purity, and prevents oxidation-related defects, making it suitable for high-end laboratory coating processes.
3. Convenient and Easy-to-Use Operation: Touchscreen interface with pre-set coating process parameters, supporting the storage and recall of multiple parameter sets to streamline operation, lower the learning curve, enable quick onboarding for beginners, and minimize human error.
4. Laboratory-Adapted Design: Compact cavity structure that is small in size, occupies minimal space, and is easy to maintain; it can be conveniently placed on various laboratory workstations, allows for simple target material replacement, and meets the needs of scientific research experiments.
5. Wide range of applications: Functional thin films can be deposited on substrates such as cutting tools, molds, optical components, and electronic devices, making them widely used in surface modification experiments across fields including materials science, mechanical engineering, and optoelectronic components.
| Project | Details | |
| Vacuum chamber | Water-cooled stainless steel chamber | |
| φ500mm × 490mm (H) | ||
| Front-opening design, equipped with a φ100 mm quartz observation window. | ||
| Equipped with two sets of infrared heating lamps for cavity baking and degassing. | ||
| Multiple CF interfaces are reserved for installing multiple film-thickness gauges. | ||
| Intake System | Mass flow meter for Ar gas, 0–200 sccm | |
| N2 gas: 0–200 sccm; other flow rates or gases available upon customization. | ||
| Power Supply Requirements | AC 220V 50Hz 10kW | |
| Control Method | 15-inch touch screen configuration control software | |
| Multi-arc target | Quantity Specifications | 3 inches x 2 |
| Installation Method | Lateral opposing of the cavity | |
| Operating current | 0~150A | |
| Target thickness | max 50 mm, min 20 mm | |
| Sample stage | Specifications | Planetary Hanger |
| Number of suspendable samples | Six suspension points per hanger, for a total of six hangers. | |
| Rotational speed | Orbital rotation speed: 1–20 rpm | |
| Vacuum system | Product Model | CY-GZK103-A |
| Molecular pump | Turbomolecular pump | |
| Front-stage pump | Two-stage rotary vane pump | |
| Pumping speed | Molecular pump: 600 L/s | |
| Rotary vane pump: 1.1 L/s | ||
| Ultimate vacuum | 5×10⁻⁴ Pa | |
| Vacuum port | KF40 | |
| Exhaust port | KF16 | |
| Vacuum measurement | Composite vacuum gauge | |
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