Laboratory Multi-Arc Ion Plating System

Category: Thin Film Preparation

This product utilizes gas discharge or partial ionization of the evaporated material; under the bombardment of gas ions or evaporated particles, the evaporant or reactant is deposited onto the substrate. The laboratory multi-arc ion plating system is particularly well suited for depositing hard protective coatings such as TiN.

Overview

Technical Specifications

This product is a high-performance device specifically developed to meet the needs of laboratory surface modification and hard-film deposition. With “high-efficiency multi-arc deposition, dense film quality, ultra-high vacuum cleanliness, and user-friendly operation and compatibility” as its core design principles, it combines compact sizing with practical research applications. It is ideally suited for a wide range of coating scenarios in university, research institute, and corporate laboratories, providing stable and reliable hardware support for surface coating on substrates such as metals, ceramics, and alloys. 
Key features: 
1. High-efficiency multi-arc ion deposition: Utilizing a multi-arc target configuration, this process achieves a high ionization rate and rapid deposition, enabling the fabrication of hard coatings such as metallic, nitride, and carbide films that are dense, exhibit strong adhesion, and offer excellent wear and corrosion resistance. 
2. High-Vacuum Clean Coating: The high-vacuum chamber design effectively isolates the system from external impurities, minimizes gas interference, ensures film purity, and prevents oxidation-related defects, making it suitable for high-end laboratory coating processes. 
3. Convenient and Easy-to-Use Operation: Touchscreen interface with pre-set coating process parameters, supporting the storage and recall of multiple parameter sets to streamline operation, lower the learning curve, enable quick onboarding for beginners, and minimize human error. 
4. Laboratory-Adapted Design: Compact cavity structure that is small in size, occupies minimal space, and is easy to maintain; it can be conveniently placed on various laboratory workstations, allows for simple target material replacement, and meets the needs of scientific research experiments. 
5. Wide range of applications: Functional thin films can be deposited on substrates such as cutting tools, molds, optical components, and electronic devices, making them widely used in surface modification experiments across fields including materials science, mechanical engineering, and optoelectronic components.

ProjectDetails
Vacuum chamberWater-cooled stainless steel chamber
φ500mm × 490mm (H)
Front-opening design, equipped with a φ100 mm quartz observation window.
Equipped with two sets of infrared heating lamps for cavity baking and degassing.
Multiple CF interfaces are reserved for installing multiple film-thickness gauges.
Intake SystemMass flow meter for Ar gas, 0–200 sccm
N2 gas: 0–200 sccm; other flow rates or gases available upon customization.
Power Supply RequirementsAC 220V 50Hz 10kW
Control Method15-inch touch screen configuration control software
Multi-arc targetQuantity Specifications3 inches x 2
Installation MethodLateral opposing of the cavity
Operating current0~150A
Target thicknessmax 50 mm, min 20 mm
Sample stageSpecificationsPlanetary Hanger
Number of suspendable samplesSix suspension points per hanger, for a total of six hangers.
Rotational speedOrbital rotation speed: 1–20 rpm
Vacuum systemProduct ModelCY-GZK103-A
Molecular pumpTurbomolecular pump
Front-stage pumpTwo-stage rotary vane pump
Pumping speedMolecular pump: 600 L/s
Rotary vane pump: 1.1 L/s
Ultimate vacuum5×10⁻⁴ Pa
Vacuum portKF40
Exhaust portKF16
Vacuum measurementComposite vacuum gauge

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