Small High-Vacuum Dual-Source Thermal Evaporation Coating System

This product is a compact, high-performance device specifically designed and developed for thin-film deposition in laboratory settings. Its core positioning emphasizes “small footprint and ease of use, dual-source synergy, high-vacuum cleanliness, and precise control,” balancing practicality with coating accuracy. With its compact size and simple operation, it is ideally suited for thin-film deposition applications in university, research institute, and corporate laboratories. It provides stable and reliable hardware support for thermal evaporation deposition of a wide range of materials, including metals, organics, and dielectrics, thereby meeting the diverse needs of basic research and small-batch sample preparation.
Key features:
1. Compact and Portable Design: Featuring a desktop, space-saving configuration that is both compact in size and lightweight, this system requires minimal laboratory space and can be conveniently placed directly on the workbench. It is highly mobile, easy to install, and requires no complex calibration, enabling rapid deployment for experimental use.
2. Dual-Source Independent Synergy: Equipped with two independent evaporation sources that support independent temperature control and can operate either separately or simultaneously, enabling flexible deposition of single-layer and multilayer composite films without the need for frequent material changes, thereby significantly enhancing experimental efficiency.
3. High-Vacuum Clean Coating: Equipped with a high-efficiency, high-vacuum system that achieves laboratory-grade vacuum levels, effectively isolating the coating process from atmospheric impurities to ensure film purity, density, and adhesion, thereby preventing pinholes and defects in the film.
4. Precise and Easy-to-Control Operation: A streamlined touch-control interface enables precise adjustment of key parameters such as evaporation temperature, coating time, and film thickness. The system supports the storage and recall of multiple process parameter sets, lowering the operational threshold, minimizing human error, and ensuring experimental reproducibility.
5. Wide range of applications: It can be used for the preparation of various thin films, including metal films, dielectric films, and organic thin films, making it suitable for fundamental laboratory research and small-batch sample preparation in fields such as materials science, microelectronics, optics, and new energy.