2L Plasma Cleaner, 500W, 1000W

Category: Sample Cleaning

This product is a 2-liter plasma cleaner, standardly equipped with either a 500 W or 1000 W dual-power option. Its compact, non-destructive design makes it ideal for precision cleaning applications. It employs low-pressure dry plasma cleaning technology, eliminating the need for liquid media and thereby preventing secondary contamination of the workpiece at the source. Equipped with a dedicated mechanical vacuum pump, it maintains stable chamber vacuum levels while rapidly evacuating post-plasma-reaction contaminants, ensuring thorough removal of organic impurities in a short time. The process is highly efficient and gentle on the workpiece, making it well-suited for small-batch, fine-scale processing in laboratory settings.

Overview

Technical Specifications

This product is a surface-treatment device that employs advanced plasma technology. By leveraging the active species in the fourth state of matter—plasma—it delivers surface-treatment results that are difficult to achieve through conventional cleaning methods. Its primary applications include cleaning the surfaces of various materials to remove organic contaminants such as oils and oxide layers, as well as modifying material surfaces to enhance adhesion, compatibility, and wettability. It finds extensive use across multiple industries, including metal processing, automotive manufacturing, electronics, and semiconductors.

Key features:

1. High-frequency, stable RF design utilizes a 13.56 MHz standard RF power supply, compatible with various commonly used gas plasmas, ensuring uniform and stable discharge for consistent surface treatment results.

2. Flexible power options ranging from 100 W to 1,000 W, with the primary power range of 500 W to 1,000 W, precisely tailored to meet the processing requirements of various materials and processes.

3. Highly adaptable to various application scenarios, with a compact footprint and integrated functionality, it supports both laboratory R&D and small-batch production. Combining cleaning and surface modification in a single system, it efficiently activates material surfaces, removes contaminants, and improves the yield of subsequent processing steps.

Main ComponentsIndicator NameParameter Metrics
Clean the hopperCleaning chamber materialHigh-purity quartz
Cleaning chamber dimensionsDiameter: 113 mm; Length: 280 mm
Radio Frequency Power SupplyPower Supply CharacteristicsThis power supply is a fully solid-state RF power supply that employs highly stable and reliable power amplifier and DC modules, effectively ensuring stable RF power output. The use of high-quality electronic components further guarantees the product’s reliability.
Power Supply Advantages● Can operate normally for extended periods
● Simple and flexible operation
● High power efficiency and low heat generation
● Features comprehensive reflected power protection
Radio Frequency Power0–500 W continuously adjustable / 0–1000 W continuously adjustable
Signal frequency13.56 MHz ±0.005%
Reflected Power≤200W
Power stability±0.1%
RF connectorN-type head
Overall machine efficiency≥75%
Harmonic component≤-50 dBc
Cooling methodForced Air Cooling
Gas measurementMeasurement componentFloat flowmeter
Gas channelTwo channels
Channel A range10–100 ml
B-channel range16–160 ml
Vacuum acquisitionVacuum measurementDigital vacuum gauge (resistance gauge)
Vacuum extractionTwo-stage rotary vane pump
Motor speedAt 50 Hz: 1440; at 60 Hz: 1720.
Pumping speedAt 50 Hz: 1.1 L/s; at 60 Hz: 1.3 L/s.
Vacuum range1 Pa to 100,000 Pa
Ultimate vacuum 1Pa
Motor noise≤56dB
Pipeline interfaceInlet: KF16; Outlet: KF16.
Connect the pipelineKF16 Vacuum Bellows
Vacuum valveSolenoid valve
Motor power400W
OtherPower supplyAC 220V 50/60Hz
Total machine power1000W/1500W
Operating temperature-10℃–40℃
Work vacuum≤40Pa
Overall dimensions540mm × 650mm × 600mm
Overall weight78kg

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