15L Plasma Cleaner
Category: Sample Cleaning
Overview
Technical Specifications
This product is a high-tech device based on plasma technology. It generates plasma—the fourth state of matter—by energizing a gas, and uses the resulting active species, such as ions and electrons, to treat sample surfaces, achieving results that conventional cleaning methods cannot attain. It is suitable for both laboratory settings and small-scale production environments. Its primary applications include deep surface cleaning of samples; additionally, under specific conditions, it can modify material surfaces to enhance adhesion, compatibility, and wettability, thereby meeting the requirements of coating and other related processes.
Key Features
1. Precise Capacity Matching: The standard 15-liter chamber design is specifically tailored for laboratory R&D and small-batch production, enabling both meticulous processing of small samples and efficient handling of small-scale batch operations. It offers high space utilization and highly targeted applicability across various scenarios.
2. Outstanding power performance: Equipped with a 13.56 MHz high-frequency RF power supply, it delivers exceptional stability and high excitation efficiency, precisely matching a variety of commonly used gases such as argon and oxygen to rapidly generate highly active plasma, thereby ensuring uniform and stable processing results.
3. Flexible power adjustment: The RF power supply covers the full range from 100 W to 1000 W, with multiple commonly used power settings available for on-demand selection. This allows precise power tuning based on sample material and processing requirements, balancing processing efficiency with sample protection to meet a wide variety of application scenarios.
| Main Components | Indicator Name | Parameter Metrics |
| Clean the hopper | Cleaning chamber material | SS304 |
| Cleaning chamber dimensions | 200x160x240mm | |
| Coupling method | Capacitive coupling | |
| Radio Frequency Power Supply | Power Supply Characteristics | This power supply is a fully solid-state RF power supply that employs highly stable and reliable power amplifier and DC modules, effectively ensuring stable RF power output. The use of high-quality electronic components further guarantees the product’s reliability. |
| Power Supply Advantages | ● Can operate normally for extended periods | |
| ● Simple and flexible operation | ||
| ● High power efficiency and low heat generation | ||
| ● Features comprehensive reflected power protection | ||
| Radio Frequency Power | Continuously adjustable from 0 to 300 W | |
| Signal frequency | 13.56 MHz ±0.005% | |
| Reflected Power | ≤100W | |
| Power stability | ±0.1% | |
| RF connector | N-type head | |
| Overall machine efficiency | ≥75% | |
| Harmonic component | ≤-50 dBc | |
| Cooling method | Forced Air Cooling | |
| Gas measurement | Measurement component | Two-channel mass flow meters: Ar 0–200 sccm; O₂ 0–200 sccm; customizable. |
| Refer to previous products for other parameters. | ||
| Gas channel | Two channels | |
| Channel A range | 10–100 ml | |
| B-channel range | 16–160 ml | |
| Vacuum acquisition | Vacuum measurement | Digital vacuum gauge (resistance gauge) |
| Vacuum extraction | Two-stage rotary vane pump | |
| Motor speed | At 50 Hz: 1440; at 60 Hz: 1720. | |
| Pumping speed | At 50 Hz: 240 L/min; at 60 Hz: 288 L/min. | |
| Vacuum range | 0.1 Pa to 10,000 Pa | |
| Ultimate vacuum | 0.5Pa | |
| Motor noise | ≤56dB | |
| Pipeline interface | Inlet: KF16; Outlet: KF16. | |
| Connect the pipeline | KF16 Vacuum Bellows | |
| Vacuum valve | KF16 Ball Valve | |
| Motor power | 400W | |
| Other | Power supply | AC 220V 50/60Hz |
| Total machine power | 800W | |
| Operating temperature | -10℃ -- 40℃ | |
| Work vacuum | ≤40Pa | |
| Overall dimensions | 600mmX650mmX560mm | |
| Overall weight | 80 kg (including packaging) | |
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