Compact UV-Ozone Cleaner

This compact UV–ozone cleaning machine employs a high-power, low-pressure quartz mercury lamp to generate ultraviolet light at wavelengths of 185 nm and 254 nm. The 185-nm radiation converts oxygen molecules (O₂) into active ozone molecules (O₃), while the 254-nm radiation simultaneously excites organic molecules on the surface to be cleaned, making them more readily absorbed and decomposed by ozone. This dry-cleaning technology requires no solvents and causes no damage to the cleaned surface. Because ozone molecules have a short lifetime and are also photolyzed by the 254-nm radiation, the performance can be optimized by adjusting the distance between the sample stage and the lamp.
Features and advantages of the compact UV-ozone cleaning machine:
1. Cleaning organic contaminants, oils, and residual photoresist; cleaning the AFM tip and the sample substrate.
2. Small footprint, operates at atmospheric pressure, requires no vacuum, and ensures damage-free drying;
3. Equipped with a heated stage to accelerate cleaning, along with safety features such as interlocks and catalytic ozone purification.
4. Compatible with multiple substrates, including silicon, glass, ceramics, and III-V semiconductors.