5L Plasma Cleaner Capacitive Coupling

Category: Sample Cleaning

This product employs advanced capacitive coupling technology, using plasma—the fourth state of matter formed by the ionization of gases through energy input—as the core processing medium, making it a high-quality upgrade over conventional cleaning equipment. By leveraging the active species in the plasma, the system can clean and coat the surfaces of samples made from a wide range of materials, delivering performance that far surpasses conventional cleaning methods while ensuring thorough treatment with no residual contamination. Its compact 5-liter chamber is ideally suited for small-scale production and research applications, compatible with multiple material types without compromising sample properties, and combines cutting-edge technology, high cleaning efficiency, and broad adaptability.

Overview

Technical Specifications

This product employs advanced capacitive coupling technology, using plasma—the fourth state of matter formed by the ionization of a gas through energy input—as the core processing medium, making it a high-quality upgrade and replacement for conventional cleaning equipment. Its primary application is to treat sample surfaces by leveraging the active species in plasma, such as ions, electrons, and reactive radicals, thereby achieving cleaning and coating results that are unattainable with conventional methods and meeting the surface treatment needs of a wide range of material types.

Key features:

1. Technological Leadership: Equipped with capacitive coupling technology, the plasma is stably ignited, enabling high-precision surface treatment that significantly outperforms conventional cleaning methods.

2. Outstanding Cleaning Performance: Leveraging plasma-active species, the sample surface is thoroughly treated with no residual contamination, effectively overcoming technical challenges that are difficult to address through conventional cleaning methods.

3. Wide Compatibility: The compact 5-liter chamber design caters to both small-scale production and research applications, supports a variety of materials, and ensures that the intrinsic properties of the sample remain intact throughout the process.
 

Main Components Indicator Name Parameter Metrics
Clean the hopper Cleaning chamber material SS304
Cleaning chamber dimensions 200x160x240mm
Coupling method Capacitive coupling
Radio Frequency Power Supply Power Supply Characteristics This power supply is a fully solid-state RF power supply that employs highly stable and reliable power amplifier and DC modules, effectively ensuring stable RF power output. The use of high-quality electronic components further guarantees the product’s reliability.
Power Supply Advantages ● Can operate normally for extended periods
● Simple and flexible operation
● High power efficiency and low heat generation
● Features comprehensive reflected power protection
Radio Frequency Power Continuously adjustable from 0 to 300 W
Signal frequency 13.56 MHz ±0.005%
Reflected Power ≤100W
Power stability ±0.1%
RF connector N-type head
Overall machine efficiency ≥75%
Harmonic component ≤-50 dBc
Cooling method Forced Air Cooling
Gas Measurement Measurement component Two-channel mass flow meters: Ar 0–200 sccm; O₂ 0–200 sccm; customizable.
Refer to previous products for other parameters.
Gas channel Two channels
Channel A range 10–100 ml
B-channel range 16–160 ml
Vacuum acquisition Vacuum measurement Digital vacuum gauge (resistance gauge)
Vacuum extraction Two-stage rotary vane pump
Motor speed At 50 Hz: 1440; at 60 Hz: 1720.
Pumping speed At 50 Hz: 240 L/min; at 60 Hz: 288 L/min.
Vacuum range 0.1 Pa to 10,000 Pa
Ultimate vacuum 0.5Pa
Motor noise ≤56dB
Pipeline interface Inlet: KF16; Outlet: KF16.
Connect the pipeline KF16 Vacuum Bellows
Vacuum valve KF16 ball valve
Motor power 400W
Other Power supply AC 220V 50/60Hz
Total machine power 800W
Operating temperature -10℃ -- 40℃
Work vacuum ≤40Pa
Overall dimensions 600mmX650mmX560mm
Overall weight 80 kg (including packaging)

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