10L Plasma Cleaner, 500W/1000W

Category: Sample Cleaning

This product is a compact, non-destructive, high-tech surface treatment device. It employs low-pressure plasma technology and operates without liquid media, thereby eliminating secondary contamination. Paired with a mechanical vacuum pump, it simultaneously evacuates the chamber and removes reaction byproducts, achieving rapid and thorough cleaning. The equipment is equipped with a standard 13.56 MHz RF power supply, offering flexible power options from 100 W to 1000 W, and integrates cleaning and surface modification in one unit. It is suitable for both laboratory use and small-scale production, finds broad applications across multiple industries, and effectively enhances the quality of surface treatment.

Overview

Technical Specifications

This product is a surface-treatment device that employs advanced plasma technology, leveraging the active species in the fourth state of matter—plasma—to achieve results unattainable through conventional cleaning methods. Its primary applications include cleaning the surfaces of various materials to remove organic contaminants such as oils and oxide layers, as well as modifying material surfaces to enhance adhesion, compatibility, and wettability. It finds extensive use across industries such as metallurgy, automotive manufacturing, textiles, biomedicine, aerospace, electronics, semiconductors, LED production, and plastics and rubber.

Key features:

1. High-frequency, stable RF design utilizing a 13.56 MHz standard RF power supply, compatible with various commonly used gas plasmas, ensuring uniform and stable discharge for consistent surface treatment results;

2. Power output is flexibly configurable, covering a wide range of specifications from 100 W to 1000 W, with support for mainstream power levels of 500 W and 1000 W, ensuring precise adaptation to the processing requirements of various materials and processes.

3. Outstanding scene adaptability, compact footprint, and integrated functionality make this solution suitable for both laboratory R&D and small-batch production. It combines cleaning and surface modification in a single system, efficiently activating material surfaces and removing contaminants, thereby enhancing the yield of subsequent processing steps.

Main Components Indicator Name Parameter Metrics
Clean the hopper Cleaning chamber material High-purity quartz
Cleaning chamber dimensions Diameter: 220 mm; Length: 350 mm
Radio Frequency Power Supply Power Supply Characteristics This power supply is a fully solid-state RF power supply that employs highly stable and reliable power amplifier and DC modules, effectively ensuring stable RF power output. The use of high-quality electronic components further guarantees the product’s reliability.
Power Supply Advantages ● Can operate normally for extended periods
● Simple and flexible operation
● High power efficiency and low heat generation
● Features comprehensive reflected power protection
Radio Frequency Power 0–500 W continuously adjustable / 0–1000 W continuously adjustable
Signal frequency 13.56 MHz ±0.005%
Reflected Power ≤200W
Power stability ±0.1%
RF connector N-type head
Overall machine efficiency ≥75%
Harmonic component ≤-50 dBc
Cooling method Forced Air Cooling
Gas Measurement Measurement component Float flowmeter
Gas channel Two channels
Channel A range 10–100 ml
B-channel range 16–160 ml
Vacuum acquisition Vacuum measurement Digital vacuum gauge (resistance gauge)
Vacuum extraction Two-stage rotary vane pump
Motor speed At 50 Hz: 1440; at 60 Hz: 1720.
Pumping speed At 50 Hz: 1.1 L/s; at 60 Hz: 1.3 L/s.
Vacuum range 1 Pa to 100,000 Pa
Ultimate vacuum 1Pa
Motor noise ≤56dB
Pipeline interface Inlet: KF16; Outlet: KF16.
Connect the pipeline KF16 Vacuum Bellows
Vacuum valve Solenoid valve
Motor power 400W
Other Power supply AC 220V 50/60Hz
Total machine power 1000W/1500W
Operating temperature -10℃ - 40℃
Work vacuum ≤40Pa
Overall dimensions 670mm × 670mm × 600mm
Overall weight 110kg

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