2L Plasma Cleaner, 300W

Category: Sample Cleaning

This product is a compact, non-destructive 2-liter cleaning device. It employs low-pressure excited plasma as the cleaning medium, effectively eliminating secondary contamination that can result from liquid cleaning agents. The instrument is equipped with a mechanical vacuum pump that not only maintains the chamber’s vacuum during the cleaning process but also evacuates the plasma-reacted contaminants through the pump; thus, even short-duration cleaning can thoroughly remove organic contaminants.

Overview

Technical Specifications

This product is a surface-treatment device that employs advanced plasma technology. By leveraging the active species in the fourth state of matter—plasma—it delivers surface-treatment results that are difficult to achieve through conventional cleaning methods. Its primary applications include cleaning the surfaces of various materials to remove organic contaminants such as oils and oxide layers, as well as modifying material surfaces to enhance adhesion, compatibility, and wettability. It finds extensive use across multiple industries, including metal processing, automotive manufacturing, electronics, and semiconductors.

Key features:

1. High-frequency, stable RF design utilizing a 13.56 MHz standard RF power supply, compatible with various commonly used gas plasmas, ensures uniform and stable discharge, thereby guaranteeing consistent surface treatment results.

2. Flexible power options ranging from 100 W to 1,000 W, with 300 W as the standard configuration, precisely tailored to meet the processing requirements of various materials and processes.

3. Highly adaptable to various application scenarios, with a compact footprint and integrated functionality, it supports both laboratory R&D and small-batch production. Combining cleaning and surface modification in a single system, it efficiently activates material surfaces, removes contaminants, and improves the yield of subsequent processing steps.

Main ComponentsIndicator NameParameter Metrics
Clean the hopperCleaning chamber materialHigh-purity quartz
Cleaning chamber dimensionsDiameter: 120 mm; Length: 280 mm
Radio Frequency Power SupplyPower Supply CharacteristicsThis power supply is a fully solid-state RF power supply that employs highly stable and reliable power amplifier and DC modules, effectively ensuring stable RF power output. The use of high-quality electronic components further guarantees the product’s reliability.
Power Supply Advantages● Can operate normally for extended periods
● Simple and flexible operation
● High power efficiency and low heat generation
● Features comprehensive reflected power protection
Radio Frequency PowerContinuously adjustable from 0 to 300 W
Signal frequency13.56 MHz ±0.005%
Reflected Power≤100W
Power stability±0.1%
RF connectorN-type head
Overall machine efficiency≥75%
Harmonic component≤-50 dBc
Cooling methodForced Air Cooling
Gas MeasurementMeasurement componentFloat flowmeter
Gas channelTwo channels
Channel A range10–100 ml
B-channel range16–160 ml
Vacuum acquisitionVacuum measurementDigital vacuum gauge (resistance gauge)
Vacuum extractionTwo-stage rotary vane pump
Motor speedAt 50 Hz: 1440; at 60 Hz: 1720.
Pumping speedAt 50 Hz: 1.1 L/s; at 60 Hz: 1.3 L/s.
Vacuum range1 Pa to 100,000 Pa
Ultimate vacuum1Pa
Motor noise≤56dB
Pipeline interfaceInlet: KF16; Outlet: KF16.
Connect the pipelineKF16 Vacuum Bellows
Vacuum valveSolenoid valve
Motor power400W
OtherPower supplyAC 220V 50/60Hz
Total machine power800W
Operating temperature-10℃ to 40℃
Work vacuum≤40Pa
Overall dimensions560mm×650mm×480mm
Overall weight65 kg (including packaging)

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