Vacuum Corrosion-Resistant Spin Coater

Category: Programmable Spin Coater

This vacuum-corrosion-resistant spin coater features a vacuum-sealed chamber with a pressure-rated inner cavity and lid, enabling the chamber to be evacuated to a negative pressure of at least –0.06 MPa for spin-coating operations. It is specifically designed to handle highly corrosive, easily foaming, and difficult-to-volatilize coating liquids that conventional spin coaters struggle to process. It is primarily used in applications such as chip manufacturing, battery production, optical glass processing, sensor fabrication, ceramic substrate production, and precision component assembly, delivering a high-quality, uniform, bubble-free, pinhole-free, and corrosion-resistant thin film.

Overview

Technical Specifications

This vacuum-protected spin coater is a spin-coating system that integrates vacuum adsorption with a corrosion-resistant chamber, designed for applying photoresist and acidic or alkaline etchants onto wafers and substrates. The equipment supports both vacuum and conventional operating modes and can function either by evacuating the chamber or by employing vacuum adsorption of the substrate.

Key features: 
1. The main housing of the vacuum anti-corrosion spin coater is made of PP, which is corrosion-resistant and easy to clean. 
2. The inner cavity is made of easy-to-clean, corrosion-resistant ultra-high-molecular-weight polyethylene (HDPE). 
3. Industrial-grade servo motors are used, with a motor design that prevents contaminants such as photoresist from entering the motor interior. 
4. The exhaust and pumping system is positioned at the bottom of the sample stage (to enhance exhaust efficiency and spin-coating uniformity). 
5. A transparent, chemically resistant sealing lid that prevents photoresist overflow during spin-coating and effectively blocks the release of toxic fumes.

Spin-coating procedureUp to 100 programs can be stored, with each program containing up to 100 steps, and each step can be controlled to within 0.1 seconds.
Rotational speed0–10,000 rpm (higher speeds available as an option)
Spin-coating acceleration0–50,000 rpm/sec (no load)
Stability Error of Motor Spin-Coating Rotational Speed<±1 rpm
Rotational Speed Regulation Accuracy and Repeatability1rpm
DisplayWith vacuum digital display
Process Time Setting0–3,000 sec/step, time setting resolution: 0.1 sec
Supports wafer sizesFragments up to 200 mm (8-inch wafers)

Price Inquiry

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