Multi-Arc Ion Coating Machine

Category: Multi-arc ion plating

This ion-plating product seamlessly integrates glow-discharge phenomena, plasma technology, and vacuum evaporation, which not only significantly enhances film quality but also broadens the application scope of thin films. It boasts advantages such as a high deposition rate, strong film adhesion, excellent conformality, and a wide range of available coating materials, making it particularly well suited for depositing hard protective coatings like TiN. Moreover, by controlling the process atmosphere, the color of the deposited film can be tailored, and the film exhibits robust adhesion to the substrate, thereby enabling the production of decorative coatings in a variety of colors.

Overview

Technical Specifications

This high-performance equipment is specifically designed for laboratory and small-batch precision coating applications, with a core positioning of “dense film layers, strong adhesion, and broad target material compatibility.” It strikes an optimal balance between research-grade precision and ease of operation, making it ideally suited for universities, research institutes, and corporate R&D departments. The system provides stable and reliable hardware support for precision coating of diverse substrates, including metals, alloys, and ceramics, thereby advancing research and small-batch production in fields such as optics, electronics, and mechanical engineering.

Key Features

1. Core Process Advantages: This system employs multi-arc ion plating technology, in which arc discharge is used to excite the target material and generate a plasma, enabling rapid film deposition. Compared with conventional coating equipment, this process yields films with higher density and stronger adhesion to the substrate, making them less prone to delamination or wear. Moreover, it allows for precise control of film thickness, thereby meeting the stringent requirements of precision coating applications.

2. Flexible multi-target compatibility: Equipped with multiple independent arc sources, the system supports single-target deposition, alternating multi-target deposition, or co-deposition, and is compatible with a wide range of target materials, including metals and alloys such as titanium, chromium, gold, and silver. This enables flexible fabrication of single-layer and multilayer composite films, significantly expanding process versatility for both research and production and meeting diverse coating requirements across various applications.

3. Precise and Controllable Operation: Equipped with a high-precision vacuum control system, arc power supply, and temperature-control module, this equipment enables precise adjustment of critical parameters such as vacuum level, arc current, and coating time. The temperature field is uniform and stable, effectively preventing defects like color variation, pinholes, and cracking in the coating layer, thereby ensuring consistent coating quality. The touch-screen interface is simple and intuitive, with multiple sets of standard process parameters pre-programmed, allowing even novice operators to quickly get up to speed and reducing human error.

4. High laboratory adaptability: The modular, compact design ensures a moderate footprint and efficient space utilization, allowing flexible placement on laboratory workstations; it features low operating noise, excellent sealing performance, and easy maintenance, with no need for complex installation or commissioning, making it suitable for research experiments, educational demonstrations, and small-batch precision coating production.

5. Safe and Reliable Operation: The system is equipped with multiple safety features, including arc protection, over-temperature warning, vacuum detection, and leakage protection, effectively mitigating safety risks during the coating process. The furnace chamber is constructed from high-temperature and corrosion-resistant materials, extending equipment service life and ensuring long-term stable operation.

Sample stage Size Planetary sample stage, outer diameter 305 mm, with six stations around the perimeter.
Workpieces can be suspended from the support rods at each workstation.
External rotation speed is adjustable from 1 to 20 rpm.
Multi-arc ion target Quantity φ84mm × 2
Vacuum chamber Cavity dimensions φ300mm × 400mm
Observation Window Front-mounted φ100mm with a light shield
Cavity material 304 stainless steel
Activation method Front-opening type
Film Thickness Control Crystal oscillator-based film thickness gauge, with optional multi-channel film thickness controller
Vacuum system Front-stage pump Two-stage rotary vane pump
Vacuum port KF16
Secondary pump Turbomolecular pump
Vacuum port CF160
Vacuum measurement Resistance-plus-ionization composite vacuum gauge
Exhaust rate Mechanical pump 1.1 L/s
Molecular pump, 600 L/s
Ultimate vacuum 1.0E-5Pa
Power supply AC 220V 50/60Hz
Pumping speed Rotary vane pump: 1.1 L/s
Control System Automatic Control – Operating Interface: Touch Screen + Control Panel
Other Supply voltage AC 380V, 50Hz
Overall dimensions 1000mm x 800mm x 1500mm
Overall weight 350kg
Total machine power 5kW

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