Electron-beam evaporation coating system
Category： Electron-beam evaporation
Overview
Technical Specifications
This product, in an ultra-high vacuum environment:
The electron gun filament (tungsten/LaB₆) emits thermoelectrons upon heating.
The electrons are accelerated by a high voltage of 10–30 kV and then focused by electromagnetic lenses followed by a 270° magnetic deflection, resulting in a high-energy, highly precise electron beam.
An electron beam is directed at the target material housed in a water-cooled copper crucible, generating localized, instantaneous temperatures of 3,000–6,000°C, which cause the target to melt or sublimate into gaseous atoms or molecules.
Gaseous particles travel in straight lines through a vacuum and deposit onto the surface of a rotating or heated substrate, where they condense to form a uniform, dense thin film.
Throughout the entire process, a quartz crystal oscillator provides real-time monitoring of film thickness and deposition rate (0.1–10 nm/s), enabling closed-loop control.
| Terms of Use | Ambient temperature: 5°C to 40°C; Power supply: three-phase 380 V; Power rating: ≤20 kW; Water pressure: ≤2.5 bar. | |
| Vacuum chamber dimensions | Evaporation chamber dimensions: φ500 × H500 (mm) | |
| Electron gun | One set of new-type electron gun, six-hole crucible | |
| Sample Turntable | Sample dimensions: ≤φ150 mm; the sample can be rotated and vertically adjusted to regulate the distance between the sample and the electron gun (the sample holder design is customized according to user requirements); heating temperature: ≤500°C. | |
| System vacuum level | Ultimate vacuum | After 12–24 hours of baking, the continuous pumping rate shall be ≤5×10⁻⁵ Pa. |
| Pumping speed | Within 40 minutes from the start of evacuation, the vacuum level shall be ≤5×10⁻⁴ Pa. | |
| System leak rate | The overall leak rate of the system shall be ≤1×10⁻⁸ Pa·L/s. After the pump is stopped and the system is shut down for 12 hours, the vacuum level in the vacuum chamber shall be ≤10 Pa. | |
| Vacuum System | FB1200 molecular pump combined with a mechanical pump (TRP-36) system, with a bypass pumping configuration. | |
| Coating Monitoring | Monitoring is conducted using the SQM160 film thickness gauge. | |
| Coating thickness | Coating thickness non-uniformity ≤ 6% | |
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