2L40K Plasma Cleaner

Category: Materials Research (Research Equipment)

This plasma cleaner is a high-tech device that harnesses plasma to achieve results unattainable through conventional cleaning methods.

Overview

Technical Specifications

This product is a high-performance device specifically developed to meet the precise surface-treatment needs of laboratory materials, with “clean and efficient operation, precision and stability, and ease of use” as its core design principles. It combines compact, space-saving design with practical functionality, making it ideally suited for a wide range of experimental settings in university and research institute laboratories as well as corporate R&D labs. The device provides stable and reliable hardware support for the cleaning, activation, and etching of various material surfaces.

Key features:

1. Leading-edge cleaning: Utilizing customized plasma activation technology, this process efficiently removes organic contaminants and oxides from material surfaces, achieving atomic-level cleanliness, eliminating impurity-induced interference, and ensuring the purity of experimental samples as well as optimal adhesion in subsequent processing steps.

2. Precise and Efficient Operation: Equipped with a high-precision vacuum control system and a stable RF power supply, the plasma exhibits uniform density and stable energy output, ensuring consistent processing performance and meeting the precision requirements of various microdevices and substrates.

3. Convenient and Easy-to-Control Operation: Touchscreen interface combined with preset process curves simplifies the operation workflow, lowers the learning curve, enables quick onboarding for beginners, and reduces human error.

4. High adaptability for laboratory use: The compact, miniaturized design ensures a small footprint, robust and aesthetically pleasing construction, minimal space requirements, and easy maintenance, making it suitable for placement on various laboratory workstations.

5. Wide range of applications: It can be used for surface treatment of substrates such as silicon wafers, crystals, metals, polymers, and ceramics, with extensive applications in semiconductor processing, optical component fabrication, biochip preparation, polymer material modification, and other fields.

Clean the hopper

Cleaning chamber material

Stainless steel

Cleaning chamber dimensions

Diameter: 112 mm; Length: 270 mm

High-frequency power supply

Power Supply Characteristics

This power supply is a self-developed 40 kHz high-frequency unit, featuring a reliable structure and robust performance.

Power Supply Advantages

Can operate normally for a long time
Simple and flexible operation

High power efficiency and low heat generation

Radio Frequency Power

Continuously adjustable from 0 to 500 W

Signal frequency

40kHz

Power stability

±0.1%

Cooling method

Forced Air Cooling

Gas measurement

Measurement component

Float flowmeter

Gas channel

Two channels

Channel A range

10–100 ml

B-channel range

16–160 ml

Vacuum acquisition

Vacuum measurement

Resistance vacuum gauge

Vacuum extraction

Two-stage rotary vane pump

Pumping speed

At 50 Hz: 1.1 L/s; at 60 Hz: 1.3 L/s.

Vacuum range

1 Pa to 10,000 Pa

Ultimate vacuum

1Pa

Motor noise

≤56dB

Pipeline interface

Inlet: KF16; Outlet: KF16.

Connect the pipeline

KF16 Vacuum Bellows

Motor power

400W

Other

Power supply

AC 220V 50/60Hz

Total machine power

1000W

Operating temperature

-10℃ -- 40℃

Work vacuum

≤40Pa

Overall dimensions

390*367*255

Overall weight

40

 

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