2L40K Plasma Cleaner
Category: Materials Research (Research Equipment)
Overview
Technical Specifications
This product is a high-performance device specifically developed to meet the precise surface-treatment needs of laboratory materials, with “clean and efficient operation, precision and stability, and ease of use” as its core design principles. It combines compact, space-saving design with practical functionality, making it ideally suited for a wide range of experimental settings in university and research institute laboratories as well as corporate R&D labs. The device provides stable and reliable hardware support for the cleaning, activation, and etching of various material surfaces.
Key features:
1. Leading-edge cleaning: Utilizing customized plasma activation technology, this process efficiently removes organic contaminants and oxides from material surfaces, achieving atomic-level cleanliness, eliminating impurity-induced interference, and ensuring the purity of experimental samples as well as optimal adhesion in subsequent processing steps.
2. Precise and Efficient Operation: Equipped with a high-precision vacuum control system and a stable RF power supply, the plasma exhibits uniform density and stable energy output, ensuring consistent processing performance and meeting the precision requirements of various microdevices and substrates.
3. Convenient and Easy-to-Control Operation: Touchscreen interface combined with preset process curves simplifies the operation workflow, lowers the learning curve, enables quick onboarding for beginners, and reduces human error.
4. High adaptability for laboratory use: The compact, miniaturized design ensures a small footprint, robust and aesthetically pleasing construction, minimal space requirements, and easy maintenance, making it suitable for placement on various laboratory workstations.
5. Wide range of applications: It can be used for surface treatment of substrates such as silicon wafers, crystals, metals, polymers, and ceramics, with extensive applications in semiconductor processing, optical component fabrication, biochip preparation, polymer material modification, and other fields.
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Clean the hopper |
Cleaning chamber material |
Stainless steel |
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Cleaning chamber dimensions |
Diameter: 112 mm; Length: 270 mm |
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High-frequency power supply |
Power Supply Characteristics |
This power supply is a self-developed 40 kHz high-frequency unit, featuring a reliable structure and robust performance. |
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Power Supply Advantages |
Can operate normally for a long time High power efficiency and low heat generation |
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Radio Frequency Power |
Continuously adjustable from 0 to 500 W |
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Signal frequency |
40kHz |
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Power stability |
±0.1% |
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Cooling method |
Forced Air Cooling |
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Gas measurement |
Measurement component |
Float flowmeter |
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Gas channel |
Two channels |
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Channel A range |
10–100 ml |
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B-channel range |
16–160 ml |
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Vacuum acquisition |
Vacuum measurement |
Resistance vacuum gauge |
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Vacuum extraction |
Two-stage rotary vane pump |
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Pumping speed |
At 50 Hz: 1.1 L/s; at 60 Hz: 1.3 L/s. |
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Vacuum range |
1 Pa to 10,000 Pa |
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Ultimate vacuum |
1Pa |
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Motor noise |
≤56dB |
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Pipeline interface |
Inlet: KF16; Outlet: KF16. |
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Connect the pipeline |
KF16 Vacuum Bellows |
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Motor power |
400W |
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Other |
Power supply |
AC 220V 50/60Hz |
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Total machine power |
1000W |
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Operating temperature |
-10℃ -- 40℃ |
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Work vacuum |
≤40Pa |
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Overall dimensions |
390*367*255 |
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Overall weight |
40 |
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