Pull-Method Crystal Growth Furnace

Category: Diamond Growth

This product is a critical piece of equipment for the production of high-quality, large-size single crystals, boasting distinct technological advantages and playing an indispensable role across a wide range of fields—from fundamental scientific research to the modern information industry and high-end manufacturing.

Overview

Technical Specifications

This product is a specialized crystal-growth device designed for laboratory use and small-batch production, with a focus on the precise growth of both single-crystal and polycrystalline materials. Its core positioning emphasizes “precise temperature control, user-friendly operation, and stable growth,” making it well-suited for academic research, materials R&D, and small-scale crystal manufacturing. It enables high-quality growth of a wide range of inorganic crystals, including oxides, semiconductors, and optical crystals, thereby providing reliable support for the R&D and small-batch fabrication of crystal materials.

Key Features

  1. Core Technological Advantages: By employing the conventional Czochralski method in conjunction with a high-precision temperature-field control system, we can precisely regulate the crystal growth temperature, pulling speed, and rotation rate, thereby ensuring uniform crystal growth free of defects, high crystal purity, and excellent crystallinity—meeting the precision requirements for both research applications and small-batch production.
  2. Precise and Stable Temperature Control: Equipped with a high-precision temperature-control module, this system delivers accurate temperature adjustment and a uniform, stable temperature field. Users can flexibly configure heating, holding, and cooling profiles to meet the specific growth requirements of different crystals, effectively preventing defects such as cracking, the formation of unwanted phases, and non-uniform growth during crystal growth.
  3. Convenient and efficient operation: Equipped with a clear touch-control interface and pre-set parameters for multiple crystal-growth processes, it allows for quick recall and flexible adjustment; real-time monitoring of the growth process facilitates timely process adjustments, reduces operational complexity, and enables even beginners to get up to speed quickly.
  4. High adaptability: The compact, space-saving design allows for flexible placement in laboratories or small production workshops; it supports the growth of a wide range of crystal materials and can be customized to meet specific growth requirements, accommodating various crystal specifications and types.
  5. Safe and reliable: Equipped with comprehensive safety protection features, including high-temperature alerts, overload protection, and vacuum sealing, to effectively mitigate safety risks during crystal growth. The system operates stably and is easy to maintain.
Project Details
Operating voltage 240V AC, 0.2–29 kHz, three-phase
Operating current 100A
Power consumption can be achieved. 50 KW
Melting temperature Maximum: 2100°C (3812°F)
Accuracy < +/- 0.2°C, using a Euro-thermo temperature controller
Vacuum degree can be achieved. 10⁻³ torr, using a mechanical pump (inclusive)
Vacuum chamber dimensions 500 mm (diameter) × 700 mm (height)
Water-cooling method Water flows through the vacuum chamber jacket and the seed crystal rods.
Water pressure 0.13 - 0.18 MPa
Water flow rate 60 L/min
Controller Electronic control unit for controlling crystal pulling, rotation, and temperature.
Crystallizer Driven by a constant-torque DC motor
Crystal pulling rate 0.1-20mm/h
The seed crystal rod can be moved to adjust the distance. 400mm
Rotational speed 0–40 RPM
Crucible rod lifting speed Manual
The crucible rod can achieve a travel distance. 100mm
Product Dimensions Crystal Growth Controller 880 mm (length) × 1250 mm (width) × 2850 mm (height)
Control Unit 680 mm (length) × 540 mm (width) × 1700 mm (height)
Radio Frequency Power Supply 800 mm (length) × 500 mm (width) × 1500 mm (height)

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