Single-target plasma sputtering coating system

This product is a cost-effective, desktop-grade instrument designed specifically for research applications. It is widely used in materials science, electronics, and other fields, meeting the needs of SEM sample preparation, thin-film fabrication, and material surface modification. It is an ideal auxiliary device for research institutions and university laboratories.
The equipment employs low-temperature plasma sputtering, eliminating high-temperature damage and making it suitable for thermally sensitive and fragile samples. The chamber is constructed from high-purity quartz or 304 stainless steel, offering omnidirectional visibility and easy cleaning to ensure coating purity.
The system is controlled via a PLC and touch screen, enabling one-touch operation and parameter export for easy setup and use. It is equipped with an adjustable rotary sample stage, ensuring high coating uniformity with thickness deviation ≤ 0.05 μm, thereby guaranteeing experimental accuracy.
Equipped with a 150 W DC power supply and a dual-stage rotary vane pump, this system delivers reliable vacuum performance, features a compact footprint, and is compatible with a wide range of target materials, balancing ease of use with stability to provide an efficient and dependable coating solution for research applications.