Multi-source vacuum evaporation coating system
Category: Thin Film Preparation
Overview
Technical Specifications
This product is a high-performance deposition system specifically designed for advanced laboratory R&D and precision multi-source coating of small-scale samples. Its core features include multi-source collaborative control, vacuum evaporation coating, a compact desktop-friendly design, and PLC-based intelligent touch-screen operation. As a lightweight multi-source coating solution, it balances deposition expertise, operational convenience, and operational stability. Leveraging the advantages of multi-source collaborative control and a controlled vacuum environment, it meets the requirements for preparing composite films, multilayer films, and functional films on a wide range of small samples. It is widely used in laboratory R&D of small samples, small-batch pilot production, the fabrication of miniature functional thin films for semiconductor devices, graphene-assisted coating, material surface modification, and multi-material coating of research micro-samples—addressing demanding experimental needs. This system serves as the core equipment for desktop-level, high-precision multi-source vacuum evaporation coating experiments in laboratories, providing an efficient, precise, and clean integrated solution for scientific research and the preparation of high-precision, small-sample multi-source composite coatings.
Key features:
1. Multi-source collaborative control to meet diverse coating requirements: The system is equipped with multiple independent power-supplied evaporation sources, enabling flexible operation in three modes—alternating activation of multiple sources, simultaneous operation, and stepwise control—to satisfy a wide range of complex coating processes. It supports independent, simultaneous, or sequential evaporation of various materials, with precise temperature and deposition-rate control for each source, facilitating the easy fabrication of multilayer films, composite films, and functional films. This addresses the limitations of dual-source or single-source coating systems in achieving multi-material, multifunctional composite coatings, thereby meeting the advanced research needs of laboratories for the preparation of diversified composite thin films.
2. Vacuum Evaporation Technology for Superior Film Quality: This advanced vacuum evaporation coating system features a single evaporation source capable of stably delivering up to 100 A of deposition current, with an evaporation temperature as high as 1800°C. The system offers stable temperature control and current output, along with broad process compatibility. Individual evaporation parameters can be flexibly adjusted for each source, enabling precise control over film thickness, uniformity, and density. The resulting films exhibit strong adhesion, few defects, and stable performance, with tight interlayer bonding that effectively prevents pinholes, delamination, and layer separation—thus meeting the stringent requirements of cutting-edge laboratory research for coating precision and performance.
3. Compact desktop design for space-saving and easy placement: Specifically optimized for laboratory desktop environments, this device features a streamlined, compact form factor and lightweight construction, allowing it to be placed directly on standard lab workstations without requiring dedicated installation space. It is compatible with a wide range of laboratory desk layouts, making it particularly well-suited for space-constrained university labs and small research institutions—offering flexible, space-efficient operation while seamlessly integrating multi-source functionality with desktop convenience.
4. PLC Intelligent Touch Control for Efficient and Convenient Operation: Equipped with an upgraded PLC intelligent control system, the entire process is operated via a high-definition touch screen with a simple, intuitive interface and clear functional zoning. The system supports separate memory storage for multi-source coating parameters, preset programs, fault alarms, one-touch adjustment of power settings for multiple evaporation sources, and other features. It allows users to preconfigure a variety of commonly used multi-source vacuum evaporation coating programs, ensuring a streamlined operation that can be quickly mastered without extensive training. This makes it ideal for laboratory researchers and professional operators.
5. Multi-scenario adaptability and broad application scope: The system fully meets the requirements of evaporation deposition for various common metallic materials, while also accommodating the deposition needs of certain non-metallic and functional materials. It is suitable for coating small-scale samples made from a wide range of materials, including metals, oxides, semiconductors, and functional ceramics, and finds extensive use in advanced experimental applications such as laboratory R&D on small samples, small-batch pilot production, fabrication of miniature functional thin films for semiconductor devices, graphene-assisted coating, material surface modification, and multi-material coating of microscale test specimens. The vacuum environment effectively prevents oxidation of the deposited films, further enhancing the equipment’s application value.
6. Stable and Durable with Convenient, Worry-Free Maintenance: The overall structure has been optimally designed, with high-quality components selected for the core multi-evaporation units, vacuum chamber, and temperature-control system, ensuring stable, trouble-free operation, strong anti-interference capability, and long-term continuous performance—making it ideally suited for frequent, desktop-level multi-source vacuum evaporation coating experiments in laboratories. Daily maintenance is simple and convenient; no specialized personnel are required for operation and upkeep. Regular routine inspections and cleaning of the chamber and multi-evaporation units are sufficient to ensure normal equipment operation, significantly reducing laboratory equipment maintenance costs.
| Sample stage | Size | φ150mm sample |
| Height | Adjustable up and down by 150 mm | |
| Evaporation source | Quantity | Tungsten boat x2 |
| Vacuum chamber | Cavity dimensions | φ500x700mm |
| Observation Window | Front-mounted φ100mm with a light shield | |
| Cavity material | 304 stainless steel | |
| Activation Method | Front-opening type | |
| Film Thickness Control | Crystal oscillator-based film thickness gauge, with optional multi-channel film thickness controller | |
| Vacuum system | Front-stage pump | Two-stage rotary vane pump |
| Vacuum port | KF16 | |
| Secondary pump | Turbomolecular pump | |
| Vacuum port | ISO160 | |
| Vacuum measurement | Resistance-plus-ionization composite vacuum gauge | |
| Exhaust rate | Mechanical pump: 1.1 L/s; Molecular pump: 600 L/s | |
| Ultimate vacuum | 1.0E-5Pa | |
| Power supply | AC 220V 50/60Hz | |
| Pumping speed | Rotary vane pump: 1.1 L/s | |
| Flow meter | Optional: one 500 sccm argon mass flow meter | |
| Control System | PLC automatic control; operating interface: touch screen + control panel | |
| Supply voltage | AC 220V, 50Hz | |
| Other | Overall dimensions | 1200mm x 900mm x 1500mm |
| Overall weight | 500kg | |
| Total machine power | 5kW | |
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