Laboratory UV-Ozone Cleaning Machine

This laboratory UV–ozone cleaning system is a compact UV–ozone cleaner specifically designed to remove a wide range of surface contaminants from substrate samples. It employs a photochemical oxidation process involving atomized oxygen and highly reactive ozone, with UV irradiation directly stimulating surface reactions to generate volatile hydrocarbon byproducts. Through oxidative removal, nanoscale hydrocarbon layers are eliminated, resulting in an ultra-clean surface with markedly improved wettability.
The cleaning effect is achieved by irradiating the substrate surface with an appropriate lamp that delivers sufficient energy in the ultraviolet spectral range. It can be used to remove organic contaminants from most inorganic substrates, including quartz, silicon wafers, gold, nickel, aluminum, gallium arsenide, and alumina.
Laboratory UV–ozone cleaning systems are commonly used to clean samples for scanning probe microscopy, to clean atomic force microscope probes, and to remove conventional oil films and residual inorganic residues from the surfaces of scanning probe microscopy standards. They can also be employed to modify the hydrophobicity of material surfaces, thereby facilitating chemical surface modification of components and substrates. Oxidation and hardening treatments of probes help maintain their geometric integrity during scanning, while sharpened probes enhance lateral resolution.

Characteristics and advantages of the laboratory UV-ozone cleaning machine:
1. Removal of various contaminants from the surface of the substrate sample
2. Use dry-process technology for efficient surface cleaning.
3. Generate energy on wavelengths between 254 nm and 185 nm.
4. Oxygen inlet, ozone removal pump, LCD display unit
5. Sample Temperature Measurement Function
6. Buzzer for indicating cleaning completion
7. Locking function for the sample tray to prevent it from being opened during operation.