Eight-inch PTFE Chamber Corrosion-Resistant Spin Coater
Category： Thin Film Preparation
This product features a PTFE chamber that delivers exceptional corrosion resistance, withstanding exposure to acids, bases, and organic solvents. It is suitable for thin-film coating applications on various substrates, including silicon wafers, crystals, quartz, and ceramics, up to 8 inches in size. The equipment leverages precision speed-control technology to ensure uniform film deposition, enabling even coating of liquid or colloidal materials onto substrate surfaces. It finds extensive use in photoresist spin-coating, the preparation of biological culture media, and the sol–gel synthesis of polymeric thin films, among other applications. Liquid or colloidal materials are coated onto substrates such as silicon wafers, crystals, quartz, and ceramics to form thin films, primarily for photoresist spin-coating, biological culture-media production, and sol–gel fabrication of polymeric thin films.
Overview
Technical Specifications
This model is a high-performance instrument specifically developed to meet the precise thin-film coating needs of laboratories. With “corrosion resistance and durability, precision and efficiency, and ease of operation” as its core design principles, it combines compactness with practicality, making it ideally suited for a wide range of experimental settings in university, research institute, and corporate laboratories. It provides stable and reliable hardware support for various thin-film fabrication experiments, enabling the deposition of liquid or colloidal materials onto substrates such as silicon wafers, crystals, quartz, and ceramics. Its applications span photoresist spin-coating, preparation of biological culture media, sol–gel synthesis of polymeric thin films, and many other fields.
Key features:
1. Leading corrosion resistance: Specially customized PTFE chamber that withstands strong acids, strong bases, and organic solvents, eliminating corrosion and material degradation, extending equipment service life, and ensuring the purity of experimental samples.
2. Precision and Efficiency: Equipped with a high-precision motor operating at 10,000 rpm, it delivers stable, ripple-free speed control to ensure uniform film formation, meeting the requirements of various precision coating experiments; compatible with a wide range of substrates up to 8 inches in size, eliminating the need for additional adapter components.
3. Convenient and Easy to Control: Touchscreen operation combined with pre-set spin-coating profiles simplifies the workflow, lowers the learning curve, enables quick onboarding for beginners, and minimizes human error.
4. Laboratory Adaptability: Compact, miniaturized aluminum alloy construction that is sturdy, aesthetically pleasing, space-efficient, and easy to maintain, making it suitable for placement on various laboratory workstations.
| Spin Coater | Supply voltage | AC 220V, 50Hz |
| Rotational speed | 0~10,000 rpm | |
| Acceleration | 100~5000 rpm/s | |
| Rotational speed resolution | 1rpm | |
| Single-step time | 3000s | |
| Substrate size | Diameter ≤ 8 inches (200 mm) | |
| Cavity Material | Polytetrafluoro | |
| Operation Method | 7-inch HD LCD touchscreen | |
| Resin casting method | Manual resin dispensing; precision syringe pump available as an option. | |
| Coating curve | Each curve consists of 5 segments, for a total storage capacity of 5 curves. | |
| Vacuum port | φ8mm quick-connect fitting | |
| Overall dimensions | 290mm × 365mm × 310mm | |
| Overall weight | 12kg | |
| Exhaust system | Vacuum pump | Dry mechanical pump |
| Pumping speed | 50L/min | |
| Power supply | AC 220V, 50/60 Hz |
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