This product is a high-performance system specifically developed to meet the precise thin-film coating needs of large-format substrates. With “large load capacity, high precision, exceptional stability, and safe compatibility” as its core design principles, it strikes an optimal balance between industrial-grade durability and laboratory usability. It is ideally suited for uniform spin-coating experiments on large-size samples in semiconductor manufacturing, display-panel production, research institutes, and corporate laboratories, providing stable and reliable hardware support for a wide range of large-area thin-film fabrication applications.

        Key features:

1. Large-capacity compatibility: Custom-designed stainless-steel spin-coating chamber that supports substrates up to 300 mm in diameter and 2.3 mm thick; built-in waste-drain port for convenient collection of spent coating solution; and an integrated chamber-locking mechanism to prevent sample ejection during high-speed operation, ensuring safe handling.
2. Precision and Efficiency: Equipped with a high-power servo motor and a high-precision driver, this system delivers a maximum rotational speed of ≤3,000 rpm, a speed resolution of 0.2 rpm, and a maximum acceleration of 5,000 m/s², ensuring precise film uniformity and meeting the demanding requirements of high-precision coating experiments on large-format substrates.
3. Convenient and Easy to Control: Features a 15-inch Full HD touchscreen interface, supports USB-based firmware upgrades, allows pre-setting of spin-coating profiles, streamlines the operation process, lowers the learning curve, enables quick onboarding for beginners, and minimizes human error.
4. Industrial Compatibility: Paired with an oil-free vacuum pump (pumping speed of 120 L/min, KF16 vacuum port) for use in industrial-grade laboratory settings; powered by a 220 V AC, 50 Hz, 2 kW supply configuration, ensuring stable operation and easy maintenance, and suitable for placement on workbenches in various laboratories and industrial production lines.
5. Wide range of applications: Liquid or colloidal materials can be coated onto large-format substrates such as silicon wafers, glass, and wafers, with extensive use in semiconductor photoresist coating, functional film fabrication for display panels, biochip coating, and polymer thin-film preparation, among other fields.