Anhui Company Conducts Inspection of Our PECVD Equipment

Recently, a delegation led by the chairman of a technology company in Anhui Province paid a special visit to our company to conduct an in-depth inspection of our PECVD equipment. As a company with outstanding achievements in the medical and materials sectors, it produces as many as 500 million test tubes annually and has never ceased its pursuit of advanced production equipment and technological innovation. This visit was aimed at identifying new technical support to further enhance product quality and expand the company’s business scope.

　　Recently, a delegation led by the chairman of a technology company in Anhui paid a special visit to our company to conduct an in-depth inspection of our PECVD equipment. As a company with outstanding achievements in the medical and materials sectors, it produces as many as 500 million test tubes annually and has never ceased its pursuit of advanced production equipment and technological innovation. This visit was aimed at securing new technical support to further enhance product quality and expand the company’s business scope.

　　The company specializes in the R&D and manufacturing of scientific instruments, with its PECVD equipment enjoying a strong reputation in the industry. This equipment boasts a wide range of applications, particularly excelling in the semiconductor sector. The single-zone rotary PECVD system is equipped with an automated vacuum feeder that uses screw conveyance to deliver powdered materials into the furnace tube at a set rate, with the feeding rate readily adjustable by varying the screw speed. Under an inert-atmosphere environment, it enables continuous coating and surface modification of powder materials via the PECVD process. Additionally, a KF40 flange is provided at the furnace tube’s outlet for connection to a collection vessel, facilitating the collection of processed powder under inert-atmosphere conditions.

　　The equipment is also equipped with a 100 W RF power supply operating at a frequency of 13.56 MHz, capable of generating plasma in a vacuum. This high-energy plasma can activate the sample surface, significantly enhancing reaction efficiency and increasing the reaction rate—features that are widely utilized in scientific experiments such as graphene synthesis and particle coating. In addition, the device is particularly well suited for experiments involving particulate samples: a mechanical drive system enables continuous, 360° rotation of the reaction tube with adjustable speed, ensuring constant agitation and thorough mixing of the material inside the tube. This promotes extensive contact between the sample, the process gas, and the plasma, thereby guaranteeing more uniform and stable reaction outcomes.

　　During the inspection, the company’s chairman and his delegation conducted a thorough examination and evaluation of the PECVD equipment’s performance metrics, operational procedures, and overall stability. This visit is expected to lay a solid foundation for future collaboration between the two parties, enabling the company to take more confident steps in product development and industrial upgrading.